사업분야
차별화된 기술력과 창조적인 사고 더 큰 도약을 위한 도전은 계속됩니다.
APS 사업부
EUV Solution
- EUV Pellicle Mounting/Demounting System
- EUV Pellicle Inspection System
- EUV POD Inspection System
- EUV Source Generation System
EUV Pellicle Mounting/Demounting System
- EUV Pellicle Mounting/Demounting System
- EUV Pellicle Inspection System
- EUV POD Inspection System
- EUV Source Generation System
EPMD: EUV Pellicle Mounter / Demounter
Fully Automated EUV Pellicle Mounting and Demounting System
- Full automation: Support high throughput & small footprint
- Precise process control: Glue quantity, Heat temperature & Pressure, etc.
- Multiple prevention modules for the rupture of EUV Pellicle
EPIS: EUV Pellicle Inspection System
Incoming and outgoing quality control inspection system of EUV Pellicle & Pelliclized mask
- Automation: EUV Pellicle stocking, automated case unclipping and opening, etc.
- Diverse inspection area: membrane, frame, mask, etc.
- Auto Defect Review & Classification
EPODIS: EUV Pod Inspection System
Metrology and Inspection system for complex structured EUV inner Pod
- Diverse inspection targets: Particle, non-plating Area & plating Defects on the base & cover plate of the inner pod.
- Support inner pod parallelism measurement
- Support N2 Blowing Module for Removing Particles from Inner Pod
EUV Source
EUV source for EUV Inspection & Metrology tools
- Two types of EUV generation modes
HHG(High order Harmony Generation)
LPP(Laser Produced Plasma) - Excellent coherence & Low divergence (HHG)
- Application: Mask Defect Review System, EUV Transmittance/Reflectance Measurement System, Mask Pattern Inspection System(Macro defect), Etc.
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