FST

APS DIVISION

Introduction

The FST APS division, specializing in advanced product and solutions development,has been at the forefront of EUV infra tool development since 2010, starting with the EUV source.

APS Division supplies customers with essential infra tools for EUV lithography, such as the EUV pellicle mount/demount system,EUV source, and inspection system for EUV pellicles,

masks, dual pods, and so on. In order to adapt to the evolving landscape of EUV lithography, including the growing demand for EUV pellicles, next-generation scanners,

and advanced pellicle technology, the APS division actively collaborates and communicates with customers. APS Division strives to become a comprehensive solution provider for

EUV lithography, putting their utmost efforts into this endeavor.

R&D Technology

Process control

Quantity, temperature and pressure control
EUV Pellicle rupture prevention & monitoring
Automation solution

EUV Generation

Excellent coherence & low divergence (laser-like)
HHG: High order Harmonic Generation
LPP: Laser Produced Plasma
Table top scale footprint

Inspection & Measurement
Technologies

Through Pellicle Inspection
Die to Die Algorithm
Auto Defect Review & Classification

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