Pellicle Overview

Definition & Usage

FST’s Pellicle Division develops and manufactures pellicles used in IC and FPD manufacturing processes.

A pellicle is a critical component that protects the photomask during exposure by preventing direct contact with contaminants or particles, thereby minimizing mask contamination and enhancing both yield and process reliability.


FST offers a comprehensive lineup of pellicles compatible with various exposure wavelengths.

Leveraging proprietary expertise in materials engineering, thin-film coating, frame bonding, and contamination control, FST provides fully customized solutions tailored to each customer’s process requirements.

Purpose of Use
  • Prevention of photomask contamination and physical damage
  • Improvement of semiconductor device yield
  • Extension of photomask cleaning cycles and overall service life
  • Isolation from contaminants generated during repeated use
  • Principle
  • Structure
Principle
  • Principle
  • Structure

Pellicle Structure
  • Pellicle Membrane
    A thin film optimized for each exposure wavelength, offering high transmittance, high mechanical strength, and excellent thermal stability.
  • Frame
    A structural component that supports the membrane and mounts onto the photomask, designed for optimal thermal expansion characteristics and mechanical rigidity.
  • Membrane Adhesive 
    Bonds the membrane to the frame with high reliability, maintaining adhesion even under high-temperature and vacuum conditions.
  • Mask Adhesive
    Applied in certain models to allow easy attachment and detachment from the photomask.



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