Semiconductor Pellicle
- ◆ IC Pellicle Overview
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- FST’s IC pellicles are high-performance protective membranes designed to shield photomasks from contamination during high-resolution lithography processes.
- Optimized for various exposure wavelengths, these pellicles offer a range of solutions that meet the strict cleanliness and precision requirements essential for advanced circuit patterning.
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EUV Pellicle - Under Development
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ArF Immersion(193nm)
Transmittance at WavelengthItem Transmittance (%) 193nm 248nm 365nm Perfluoropolymer Perfltuoropolymer Thickness 0.28㎛ Transmittance ≥ 99.0% (at 193nm), ≥ 99.0% (at 248nm), ≥ 99.0% (at 365nm) Uniformity of TR ≤ 0.1% Transmittance Spectrum 
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ArF (193nm)
Transmittance at WavelengthItem Transmittance (%) 193nm 248nm 365nm Material Perfluoropolymer Thickness 0.84㎛ Transmittance ≥ 99.0% (at 193nm) Uniformity of TR ≤ 0.3% Transmittance Spectrum 
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KrF(248nm) Transmittance
at WavelengthItem Transmittance (%) 193nm 248nm 365nm Material Perfluoropolymer Thickness 0.82㎛ Transmittance ≥ 99.0% (at 248nm) ≥ 99.0% (at 365nm) Uniformity of TR ≤ 0.4% Transmittance Spectrum 
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G&I (365 & 436nm) Transmittance
at WavelengthItem Transmittance (%) 248nm 365nm 436nm Material Cellulose & Perfluoropolymer Thickness 1.44㎛ Transmittance ≥ 99.0% (at 365nm), ≥ 99.0% (at 436nm) Uniformity of TR ≤ 0.5% Transmittance Spectrum 
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