History

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history

2015

2011~2000

1999~1990

1989~1987

  • Feb 2012

    OHSAS 18001 acquired

  • Nov 2011

    Osan factory opened

  • Nov 2009

    Patent Acquired (Pellicle used in liquid immersion and light exposure)

  • Sep 2009

    Patent Acquired (method of manufacturing pellicle frames, pellicle and lithography devices)

  • Apr 2007

    Patent Acquired (A method of flow controlling and heating of
    the coolants that are used in semiconductor production process)

  • Mar 2007

    Company name changed from FST Inc. to FINE SEMITECH Corp.

  • Jan 2006

    Acquisition of ISO 14001 Certificate

  • Sep 2005

    Proclamation of ethics management

  • Feb 2004

    LCD Pellicle Development Completion

  • Feb 2002

    Acquired Gigatron Co.

  • Aug 2001

    Name changed – FST Inc.

  • Jun 2001

    Semi-S2 0200 acquired (Chiller)

  • Jan 2001

    KeeHung factory opened and HQ moved

  • Sep 2000

    Received Venture Company Committee Special Prize hosted by
    Small & Medium Business Administration (Minister Award)

  • Feb 2000

    CE mark obtained (Chiller)

  • Jan 2000

    Registered in KOSDAQ

  • Jun 1999

    Developed Deep-UV(ArF) Pellicle

  • Nov 1998

    Developed Thermo-electric Chiller

  • Dec 1994

    ISO9001 approved

  • Apr 1994

    Received the 9th Venture Company Grand Prize Award

  • Sep 1993

    Deep-UV(KrF) Pellicle developed

  • Aug 1989

    Corporate R&D center established (Fine Technology R&D center)

  • May 1988

    Succeeded in domestic manufacturing of Pellicle

  • Sep 1987

    Fine Semiconductor Technology Co.established
    (Paid-in capital: 50million Krw)